SOC Coating Technologies

Deposition

IBSD (Ion Beam Sputtering Deposition)

SOC manufactures and sells thin film products tailored to customers' specifications, using three types of vapor deposition systems (physical vapor deposition process). Among them, the most characteristic process is ion beam sputtering deposition (IBSD). In the process of IBSD, argon ions are irradiated to a target material (dielectrics), and their kinetic energy is used to release atoms or molecules on the surface of the material and to form a thin film on a substrate.
IBSD provides larger kinetic energy to target atoms or molecules than electron beam deposition. For this reason, the atoms or molecules are highly bonded to the substrate and form a high packing density film, allowing the film to become hard to peel off or lesson characteristics shift.

IBSD deposition

Electron beam deposition, ion-assist deposition

Measurement and Evaluation

SOC makes post-deposition evaluation, using the following devices.

• Vacuum UV photometer
• UV-visible spectrophotometer
• Infrared spectrophotometer (FT-IR)
• Optical damage test with excimer and YAG laser